Energy distributions of H and H2 in a Ar–SiH4–H2 plasma during transition from a-Si to nc-Si film deposition

Author: Moiseev T  

Publisher: IOP Publishing

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.20, Iss.2, 2011-04, pp. : 25007-25016

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Abstract