Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties

Author: Bienholz S   Semmler E   Awakowicz P   Brunken H   Ludwig A  

Publisher: IOP Publishing

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.21, Iss.1, 2012-02, pp. : 15010-15017

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract