A comparative study of dc biased RF impedance probes and Langmuir probes for the measurement of processing plasma parameters

Author： Boris D R   Fernsler R F   Walton S G  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.21, Iss.1, 2012-02, pp. : 15011-15016

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