Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Author： Brenning N   Huo C   Lundin D   Raadu M A   Vitelaru C   Stancu G D   Minea T   Helmersson U  

Publisher： IOP Publishing

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.21, Iss.2, 2012-04, pp. : 25005-25013

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