The Chemical and Morphological Properties of Boron–Carbon Alloys Grown by Plasma-Enhanced Chemical Vapour Deposition

Author： Zhang D.   Mcilroy D.N.   O'Brien W.L.   de Stasio G.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.33, Iss.20, 1998-10, pp. : 4911-4915

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Preparation of transparent water-repellent films by radio-frequency plasma-enhanced chemical vapour deposition

By Hozumi A.   Sekoguchi H.   Kakinoki N.   Takai O.  

Journal of Materials Science, Vol. 32, Iss. 16, 1997-12 ,pp. : 4253-4259

Springer Publishing Company

Access to resources Recommend Favorite

Growth of carbon nanotubes using microwave plasma-enhanced chemical vapor deposition process

By Liu R.-M.   Ting J.-M.  

Materials Chemistry and Physics, Vol. 82, Iss. 3, 2003-12 ,pp. : 571-574

Elsevier

Access to resources Recommend Favorite

Nanostructure and optical properties of CeO 2 thin films obtained by plasma-enhanced chemical vapor deposition

By Barreca D.   Bruno G.   Gasparotto A.   Losurdo M.   Tondello E.  

Materials Science and Engineering: C, Vol. 23, Iss. 6, 2003-12 ,pp. : 1013-1016

Elsevier

Access to resources Recommend Favorite

Crystalline carbon nitride films prepared by microwave plasma chemical vapour deposition

By Jiang Jinchun   Cheng Wenjuan   Zhang Yang   Zhu Hesun   Shen Dezhong  

Journal of Materials Science, Vol. 41, Iss. 13, 2006-07 ,pp. : 4117-4121

Springer Publishing Company

Access to resources Recommend Favorite

Deposition of CNx thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

By Gruger H.   Selbmann D.   Wolf E.   Leonhardt A.  

Journal of Materials Science, Vol. 32, Iss. 11, 1997-11 ,pp. : 2849-2853

Springer Publishing Company

Access to resources Recommend Favorite