Effects of deposition and annealing conditions on the structure and electrical properties of LPCVD silicon thin films

Author: Das S.   Shriram R.   Bhat K.N.   Rao P.R.S.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.35, Iss.18, 2000-09, pp. : 4743-4746

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content