Reactive ion etching of diamond in CF4, O2, O2 and Ar-based mixtures

Author： Leech P.W.   Reeves G.K.   Holland A.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.36, Iss.14, 2001-07, pp. : 3453-3459

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