Author: Ko Park Sang-Hee Lee Yong Eui
Publisher: Springer Publishing Company
ISSN: 0022-2461
Source: Journal of Materials Science, Vol.39, Iss.6, 2004-03, pp. : 2195-2197
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Deposition and characteristics of CdO films with absolutely (200)-preferred orientation
By Ma D. Ye Z. Wang L. Huang J. Zhao B.
Materials Letters, Vol. 58, Iss. 1, 2004-01 ,pp. :
The Effect of Substrate on TiO2 Thin Films Deposited by Atomic Layer Deposition (ALD)
Advanced Materials Research, Vol. 2015, Iss. 1087, 2015-03 ,pp. :
Growth of TiO2 Thin Films by Atomic Layer Deposition (ALD)
Advanced Materials Research, Vol. 2016, Iss. 1133, 2016-02 ,pp. :
Homogenous Thin Films Prepared on Microchannel Plates via Atomic Layer Deposition
Advanced Materials Research, Vol. 2015, Iss. 1096, 2015-05 ,pp. :