Physical properties of low-k films based on the co-condensation of methyltrimethoxysilane with a bridged silsesquioxane

By Kim B.   Kang J.   Lee K.   Son J.   Ko M.  

Journal of Materials Science, Vol. 42, Iss. 12, 2007-06 ,pp. : 4591-4602

Springer Publishing Company

Access to resources Recommend Favorite

Characteristics of Ir etching using Ar/Cl₂ inductively coupled plasmas

By PARK SE-GEUN   KIM CHIN-WOO   SONG HO-YOUNG   KIM HYOUN   MYUNG JU   JOO SUKHO   PARK SOON   LEE KYU-MANN  

Journal of Materials Science, Vol. 40, Iss. 18, 2005-09 ,pp. : 5015-5016

Springer Publishing Company

Access to resources Recommend Favorite

Stability of the nitrogen-deficient Ti₂AlN _x MAX phase in Ar²⁺-irradiated (Ti,Al)N/Ti₂AlN _x multilayers

By Bugnet M.   Cabioc’h T.   Mauchamp V.   Guérin Ph.   Marteau M.   Jaouen M.  

Journal of Materials Science, Vol. 45, Iss. 20, 2010-10 ,pp. : 5547-5552

Springer Publishing Company

Access to resources Recommend Favorite

Low K dielectrics in sintered Al-Zr oxide composites processed by thermal plasma heating

By Sahu D.R.   Singh S.K.   Choudhury R.N.P.   Roul B.K.  

Materials Science and Engineering: B, Vol. 106, Iss. 2, 2004-01 ,pp. : 141-147

Elsevier

Access to resources Recommend Favorite

Formation of p-n junction by plasma spraying technique to enhance the photocatalytic activity of TiO₂

By Ye F.   Ohmori A.   Li Changjiu  

Journal of Materials Science, Vol. 39, Iss. 1, 2004-01 ,pp. : 353-355

Springer Publishing Company

Access to resources Recommend Favorite