Micro-Raman spectroscopy and X-ray diffraction studies of atomic-layer-deposited ZrO₂ and HfO₂ thin films

Author： Tkachev S. Manghnani M. Niilisk A. Aarik J. Mändar H.

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.40, Iss.16, 2005-08, pp. : 4293-4298

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