Erratum to: Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1596-1596

Springer Publishing Company

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Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1589-1595

Springer Publishing Company

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Influence of film thickness and annealing atmosphere on the structural, optical and luminescence properties of nanocrystalline TiO 2 thin films prepared by RF magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 24, Iss. 7, 2013-07 ,pp. : 2453-2460

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Co,Ni-base alloy thin films deposited by r.f. magnetron sputtering in Ar/N₂ atmosphere

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Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering

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