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Plasma Chemistry and Plasma Processing, Vol. 24, Iss. 4, 2004-12 ,pp. : 511-535

Springer Publishing Company

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Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition

By Wu Sudong  

Plasma Chemistry and Plasma Processing, Vol. 33, Iss. 2, 2013-04 ,pp. : 433-451

Springer Publishing Company

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Silicon epilayers grown by chemical vapor deposition from high-purity silane

By Gusev A.   Udalov O.   Krasil’nikov V.   Maksimov G.   Kornaukhov A.   Kuznetsov O.   Uskova E.   Shmagin V.  

Inorganic Materials, Vol. 42, Iss. 8, 2006-08 ,pp. : 815-818

MAIK Nauka/Interperiodica

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Growth of Nitrogen-Containing Carbon Nanotubes by Thermal Chemical Vapor Deposition

By Handuja Sangeeta   Srivastava P.   Vankar V. D.  

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Recent Advances in Chemical Vapor Deposition

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