Molecular Beam Mass Spectrometry System for Characterization of Thermal Plasma Chemical Vapor Deposition

Author： Park Soonam   Liao Feng   Larson John M.   Girshick Steven L.   Zachariah Michael R.  

Publisher： Springer Publishing Company

ISSN： 0272-4324

Source： Plasma Chemistry and Plasma Processing, Vol.24, Iss.3, 2004-09, pp. : 353-372

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