A Global Model of Chemical Vapor Deposition of Silicon Dioxide by Direct-Current Corona Discharges in Dry Air Containing Octamethylcyclotetrasiloxane Vapor

Author: Chen Junhong   Davidson Jane  

Publisher: Springer Publishing Company

ISSN: 0272-4324

Source: Plasma Chemistry and Plasma Processing, Vol.24, Iss.4, 2004-12, pp. : 511-535

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Abstract