Author: Zhu Wen-Chao Wang Bai-Rong Xi Hai-Ling Pu Yi-Kang
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.30, Iss.3, 2010-06, pp. : 381-389
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Chiang M.-H. Liao K.-C. Lin I.-M. Lu C.-C. Huang H.-Y. Kuo C.-L. Wu J.-S. Hsu C.-C. Chen S.-H.
Plasma Chemistry and Plasma Processing, Vol. 30, Iss. 5, 2010-10 ,pp. :