Highly Selective and Low Damage Etching of GaAs/AlGaAs Heterostructure using Cl2/O2 Neutral Beam

Author： Park B.   Yeon J.   Lim W.   Kang S.   Bae J.   Yeom G.   Jhon M.   Shin S.   Chang K.   Song J.   Lee Y.   Jang J.  

Publisher： Springer Publishing Company

ISSN： 0272-4324

Source： Plasma Chemistry and Plasma Processing, Vol.30, Iss.5, 2010-10, pp. : 633-640

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