Author: Jain Ricky Girshick Steven Heberlein Joachim Mukherjee Rajesh Zhang Bin Nakamura Toshitaka Mochizuki Amane
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.30, Iss.6, 2010-12, pp. : 795-811
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Abstract