Behavior of Boron Implanted in Semiconductor Si

Author: Izumikawa T.   Matsuta K.   Tanigaki M.   Miyake T.   Sato K.   Fukuda M.   Zhu S.   Minamisono T.  

Publisher: Springer Publishing Company

ISSN: 0304-3843

Source: Hyperfine Interactions, Vol.136, Iss.3-8, 2001-11, pp. : 599-605

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract