The influence of substrate bias in I-PVD process on the properties of Ti and Al alloy films

Author: Zhang Wenjie   Yi Leeward   Tao Kai   Ma Yue   Chang Pingyi   Wu Jin  

Publisher: Springer Publishing Company

ISSN: 0957-4522

Source: Journal of Materials Science: Materials in Electronics, Vol.17, Iss.11, 2006-11, pp. : 931-935

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Abstract