Effect of sputtering power on microstructure of dielectric ceramic thin films by RF magnetron sputtering method using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ as target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 9, 2011-09 ,pp. : 1290-1296

Springer Publishing Company

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Effects of annealing temperatures on crystalline quality of ceramic thin films by RF-magnetron sputtering using Zn-enriched (Ba 0.3 Sr 0.7 )(Zn 1/3 Nb 2/3 )O 3 as target

By Ji Feifei  

Journal of Materials Science: Materials in Electronics, Vol. 23, Iss. 1, 2012-01 ,pp. : 164-168

Springer Publishing Company

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Fabrication of thin films by sputtering deposition using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ ceramic as target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 7, 2011-07 ,pp. : 771-775

Springer Publishing Company

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Effect of annealing time on microstructure and morphology of thin films by sputtering deposition with (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 6, 2011-06 ,pp. : 596-600

Springer Publishing Company

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Synthesis and Characterization of Nb-Doped TiO₂ Thin Films Prepared by RF Magnetron Sputtering

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Advanced Materials Research, Vol. 2015, Iss. 1117, 2015-08 ,pp. : 139-142

Trans Tech Publications

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