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Thermochimica Acta, Vol. 259, Iss. 2, 1995-08 ,pp. : 263-268

Elsevier

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Chlorine-atom abstraction and cluster fragmentation in the reaction of H₃Re₃(CO)₁₀(MeCN)₂ with the diphosphine ligand 4,5-bis(diphenylphosphino)-4-cyclopenten-1,3-dione (bpcd): X-ray diffraction structure of fac-ClRe(CO)₃(bpcd)

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Journal of Chemical Crystallography, Vol. 36, Iss. 1, 2006-01 ,pp. : 71-75

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Profile of Al etch rate estimated from the analysis of 3-D rarefied flow of Cl 2 , BCl 3 , and AlCl 3 in a commercial etcher

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Complexation with Diol Host Compounds. Part 35: Inclusion Compounds of 1,1,6,6-Tetraphenylhexa-2,4-diyne-1,6-diol with CCl 4 , CHCl 3 , CH 2 Cl 2 and CH 3 CN

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Chemical vapour deposition of polycrystalline AlN films from AlCl 3 -NH 3 mixtures. - Analysis and modelling of transport phenomena

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