Author: Teleshev A. T. Vasil"eva L. N. Nifant"ev E. E. Tsodikov M. V. Bukhtenko O. V. Zhdanova T. N.
Publisher: Springer Publishing Company
ISSN: 1066-5285
Source: Russian Chemical Bulletin, Vol.52, Iss.9, 2003-09, pp. : 2083-2085
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
The initial stages of oxidation of -TiAl: an X-ray photoelectron study
By Schmiedgen M. Graat P.C.J. Baretzky B. Mittemeijer E.J.
Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. :
Initial stages of growth during CVD of W on TiSi 2 substrates
Thin Solid Films, Vol. 263, Iss. 1, 1995-07 ,pp. :
Initial stages of ultra thin Ti film growth on Si(111)-7x7 surface
By Hsu H.F. Lu M.C. Fang C.K. Chen L.J. Hsiao H.L. Pi T.W.
Thin Solid Films, Vol. 428, Iss. 1, 2003-03 ,pp. :