Reactive diffusion in W–Mo–Si thin films

Author: Derafa A.   Record M.-C.   Mangelinck D.   Halimi R.   Bouabellou A.  

Publisher: Springer Publishing Company

ISSN: 1388-6150

Source: Journal of Thermal Analysis and Calorimetry, Vol.103, Iss.1, 2011-01, pp. : 111-116

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract