Development of a Diffusion Barrier Layer for Silicon and Carbon in Molybdenum - a Physical Vapor Deposition Approach

Author: Govindarajan S.   Moore J.J.   Disam J.   Suryanarayana C.  

Publisher: Springer Publishing Company

ISSN: 1543-1940

Source: Metallurgical and Materials Transactions A, Vol.30, Iss.3, 1999-03, pp. : 799-806

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