A novel approach to three-dimensional semiconductor process simulation: Application to thermal oxidation

Author: Suvorov Vasily   Hössinger Andreas   Djurić Zoran   Ljepojevic Neboysha  

Publisher: Springer Publishing Company

ISSN: 1569-8025

Source: Journal of Computational Electronics, Vol.5, Iss.4, 2006-12, pp. : 291-295

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Abstract