Nickel(II) complexes of N-(dialkylcarbamothioyl)-4-nitrobenzamide as single-source precursors for the deposition of nanostructured nickel sulfide thin films by chemical vapor deposition

Author： Saeed Sohail   Rashid Naghmana   Azad Malik Mohammad   O’Brien Paul   Wong Wing-Tak  

Publisher： Taylor & Francis Ltd

ISSN： 0095-8972

Source： Journal of Coordination Chemistry, Vol.66, Iss.16, 2013-08, pp. : 2788-2801

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Growth of semiconducting iron sulfide thin films by chemical vapor deposition from air-stable single-source metal organic precursor for photovoltaic application

By Saeed Sohail   Hussain Rizwan   Butcher Ray J.  

Journal of Coordination Chemistry, Vol. 67, Iss. 10, 2014-05 ,pp. : 1693-1701

Taylor & Francis Ltd

Access to resources Recommend Favorite

Nanoparticles and nanocrystals of a new bidentate nickel(II) complex of N-[ethyl(propan-2-yl)carbamothioyl]-4-nitrobenzamide: synthesis, characterization, and crystal structures

By Saeed Sohail   Rashid Naghmana   Hussain Rizwan   Jasinski Jerry P.   Keeley Amanda C.   Khan Sajid  

Journal of Coordination Chemistry, Vol. 66, Iss. 1, 2013-01 ,pp. : 126-138

Taylor & Francis Ltd

Access to resources Recommend Favorite

Cobalt(II) and nickel(II) cloride complexes with 4,5-(n-pyridylethylene)-dithio-1,3-dithiol-2-thiones (n = 2, 4)

By Starodub V.   Stoesser A.  

Russian Journal of Coordination Chemistry, Vol. 33, Iss. 6, 2007-06 ,pp. : 428-435

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Nickel(II) complexes of 4-acetamidobenzaldehyde N(4)-substituted thiosemicarbazones

By West D.X.   Beraldo H.   Nassar A.A.  

Transition Metal Chemistry, Vol. 24, Iss. 1, 1999-02 ,pp. : 25-28

Springer Publishing Company

Access to resources Recommend Favorite

Thermogravimetric Study of Volatile Precursors For Chemical Thin Film Deposition: Estimation of vapor pressures and source temperatures

By Niskanen A.   Hatanpää T.   Ritala M.   Leskelä M.  

Journal of Thermal Analysis and Calorimetry, Vol. 64, Iss. 3, 2001-06 ,pp. : 955-964

Springer Publishing Company

Access to resources Recommend Favorite