Reply to “Comment on isotopic mass effects for low-energy channeling in a silicon crystal”

By Zheng Li-Ping   Zhu Zhi-Yuan   Li Yong   Yan Long   Wang Song  

Radiation Effects and Defects in Solids, Vol. 166, Iss. 11, 2011-11 ,pp. : 870-872

Taylor & Francis Ltd

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Isotopic mass effects for low-energy channeling in a silicon crystal

By Zheng Li-Ping   Zhu Zhi-Yuan   Li Yong   Yan Long   Zhu De-Zhang  

Radiation Effects and Defects in Solids, Vol. 166, Iss. 11, 2011-11 ,pp. : 861-865

Taylor & Francis Ltd

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Comment on “Isotopic mass effects for low-energy channeling in a silicon crystal”

By Zhang Zhu Lin   Zhang Lai   Padmanabhan Karur R.  

Radiation Effects and Defects in Solids, Vol. 166, Iss. 11, 2011-11 ,pp. : 866-869

Taylor & Francis Ltd

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Preferential sputtering and oxidation of Nb-Ta single crystals studied by low-energy ion scattering

By Semenov V.N.   Glebovsky V.G.   Brongersma H.H.  

Vacuum, Vol. 47, Iss. 10, 1996-10 ,pp. : 1193-1196

Elsevier

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Damage profiles in LiNbO₃ by low-energy H⁺ implantation

By Lu Fei   Hu Hui   Chen Feng   Wang Xue-lin   Wang Ke-Ming  

Radiation Effects and Defects in Solids, Vol. 159, Iss. 5, 2004-05 ,pp. : 309-314

Taylor & Francis Ltd

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