Analysis of the composition of Ti-based thin films deposited on silicon by means of self-ion assisted deposition

Author： Tashlykov I. S.   Zukowski P. V.   Baraishuk S. M.   Mikhalkovich O. M.  

Publisher： Taylor & Francis Ltd

ISSN： 1042-0150

Source： Radiation Effects and Defects in Solids, Vol.162, Iss.9, 2007-09, pp. : 637-641

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