Hydrogen-Sensitive Amorphous Ferroelectric Thin Film Capacitive Devices

Author: Zhu W.   Chen X. F.   Tan O. K.   Deng J.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.44, Iss.1, 2002-01, pp. : 25-75

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