Influence of Reactor Pressure on the Formation of PZT Thin Films by Liquid Delivery MOCVD

Author： Ueda Yoshiki Abe Norikazu Otani Yohei Miyake Masato Okamura Soichiro Shiosaki Tadashi

ISSN： 1058-4587

Source： Integrated Ferroelectrics, Vol.46, Iss.1, 2002-01, pp. : 125-131

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