INTERFACIAL MICROSTRUCTURE OF HIGH-κ DIELECTRIC CaZrO x FILMS DEPOSITED BY PULSE LASER DEPOSITION IN LOW OXYGEN PRESSURE

Author: QIU X.   LIU H.   FANG F.   HA M.   LIU J.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.74, Iss.1, 2005-09, pp. : 103-111

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