STRUCTURAL AND ELECTRICAL PROPERTIES OF HIGH TEMPERATURE DEPOSITED EPITAXIAL ZNO THIN FILM FABRICATED BY RF MAGNETRON SPUTTERING

By Kim Dong Hun   Cho Nam Gyu   Park Hun   Kim Ho Gi  

Integrated Ferroelectrics, Vol. 95, Iss. 1, 2007-12 ,pp. : 35-43

Taylor & Francis Ltd

Access to resources Recommend Favorite

Microstructure and electrical properties of Ni–Cr thin films fabricated by ion beam sputtering

By Zhou J. C.   Tian L.   Yan J. W.  

Materials Science and Technology, Vol. 23, Iss. 9, 2007-09 ,pp. : 1054-1058

Maney Publishing

Access to resources Recommend Favorite

Effect of Bi deficiency on grain alignment of BiPb-2223 thin film fabricated using rf sputtering process and on critical current density properties

By Aksan M A   Altin S   Yakinci M E   Guldeste A   Balci Y  

Materials Science and Technology, Vol. 27, Iss. 1, 2011-01 ,pp. : 314-319

Maney Publishing

Access to resources Recommend Favorite

FERROELECTRIC PROPERTIES OF Ba 0.8 Sr 0.2 TiO 3 THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING

By HU WENCHENG   YANG CHUANREN   ZHANG WANLI   QIU YAN   ZHU LIN  

Integrated Ferroelectrics, Vol. 79, Iss. 1, 2006-11 ,pp. : 131-138

Taylor & Francis Ltd

Access to resources Recommend Favorite

Microstructural and Electrical Properties of (BaxSr1 − x)Ti1 + yO3 + z Thin Films Prepared by RF Magnetron Sputtering

By Baniecki J. D.   Shioga T.   Kurihara K.  

Integrated Ferroelectrics, Vol. 46, Iss. 1, 2002-01 ,pp. : 221-232

Taylor & Francis Ltd

Access to resources Recommend Favorite