CHARACTERIZATION OF (Bi,Nd) 4 Ti 3 O 12 /HfO 2 /p-TYPE Si STRUCTURES FOR MFIS-FeRAM APPLICATION

Author: TABUCHI YOSHIAKI   AIZAWA KOUZI   TAMURA TETSURO   TAKAHASHI KAZUHIRO   HOKO HIROMASA   KATO KAZUMI   ARIMOTO YOSHIHIRO   ISHIWARA HIROSHI  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.79, Iss.1, 2006-11, pp. : 211-218

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