CHARACTERISTICS OF METAL-FERROELECTRIC-INSULATOR-SILICON DEVICES USING HFSION BUFFER LAYERS

Author: Lu X. B.   Hoko H.   Maruyama K.   Ishiwara H.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.97, Iss.1, 2008-01, pp. : 84-92

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