The thermal oxidation of silicon the special case of the growth of very thin films

Author: Rochet F.   Rigo S.   Froment M.   d'Anterroches C.   Maillot C.   Roulet H.   Dufour G.  

Publisher: Taylor & Francis Ltd

ISSN: 1460-6976

Source: Advances In Physics, Vol.35, Iss.3, 1986-01, pp. : 237-274

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Abstract