Characteristics of the thermal oxidation of heavily boron-doped polycrystalline silicon thin films

Author： Boukezzata M.   Bielle-Daspet D.   Sarrabayrouse G.   Mansour F.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.279, Iss.1, 1996-06, pp. : 145-154

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Second-oxidation properties of thin polysilicon films grown by LPCVD and heavily in situ boron-doped

By Boukezzata M.   Birouk B.   Bielle-Daspet D.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 70-79

Elsevier

Access to resources Recommend Favorite

Conductivity of boron-implanted polycrystalline thin silicon films

By Mansour F.   Bouchemat M.   Boukezzata M.   Touidjen N.H.   Bielle-Daspet D.   Mirouh K.  

Thin Solid Films, Vol. 261, Iss. 1, 1995-06 ,pp. : 12-17

Elsevier

Access to resources Recommend Favorite

Investigation of Silicon Quantum Dots Embedded in Boron‐Doped Silicon Oxide Thin Films Prepared by PECVD Applying Ar Dilution

By  

PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol. 215, Iss. 2, 2018-01 ,pp. : n/a-n/a

John Wiley & Sons Inc

Access to resources Recommend Favorite

Characterization of boron-doped tin oxide thin films

By Nasser S.A.  

Thin Solid Films, Vol. 342, Iss. 1, 1999-03 ,pp. : 47-51

Elsevier

Access to resources Recommend Favorite

Doped Polycrystalline Silicon Thin Films Deposited on Glass from Trichlorosilane**

By  

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 21, Iss. 1-2-3, 2015-03 ,pp. : 54-62

John Wiley & Sons Inc

Access to resources Recommend Favorite