Structural and optical properties of hydrogenated amorphous silicon-carbon alloys grown by plasma-enhanced chemical vapour deposition at various rf powers

By Ambrosone G.   Coscia U.  

Philosophical Magazine B, Vol. 82, Iss. 1, 2002-01 ,pp. : 35-46

Taylor & Francis Ltd

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Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

By Huran J.   Safrankova J.   Kobzev A.P.  

Vacuum, Vol. 50, Iss. 1, 1998-05 ,pp. : 103-105

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Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

By Aguas H.   Silva V.   Ferreira I.   Fortunato E.   Martins R.  

Philosophical Magazine B, Vol. 80, Iss. 4, 2000-04 ,pp. : 475-486

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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

By Giorgis F.   Giuliani F.   Pirri C. F.   Tresso E.   Summonte C.   Rizzoli R.   Galloni R.   Desalvo A.   Rava P.  

Philosophical Magazine B, Vol. 77, Iss. 4, 1998-04 ,pp. : 925-944

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Solid-phase crystallization of hydrogenated amorphous silicon/hydrogenated microcrystalline silicon bilayers deposited by plasma-enhanced chemical vapor deposition

By Park C.-D.   Kim H.-Y.   Cho M.-H.   Jan K.-J.   Lee J.-Y.  

Thin Solid Films, Vol. 359, Iss. 2, 2000-01 ,pp. : 268-274

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