Author： Machura P D Hecimovic A Gallian S Winter J
Publisher： IOP Publishing
ISSN： 0963-0252
Source： Plasma Sources Science and Technology, Vol.23, Iss.6, 2014-12, pp. : 65043-65054
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
By Yu He Meng Liang Szott Matthew M McLain Jake T Cho Tae S Ruzic David N
Plasma Sources Science and Technology, Vol. 22, Iss. 4, 2013-08 ,pp. :
Access to resources
Recommend
On reactive high power impulse magnetron sputtering
Plasma Physics and Controlled Fusion, Vol. 58, Iss. 1, 2016-01 ,pp. :
By Brenning N Huo C Lundin D Raadu M A Vitelaru C Stancu G D Minea T Helmersson U
Plasma Sources Science and Technology, Vol. 21, Iss. 2, 2012-04 ,pp. :