Utilization of Si atomic steps for Cu nanowire fabrication

By  

Science and Technology of Advanced Materials, Vol. 6, Iss. 6, 2005-09 ,pp. : 119-122

IOP Publishing

Access to resources Recommend Favorite

Structure of planar defects in (Sr 0.9 Ca 0.3 ) 1.1 CuO 2 infinite-layer superconductors by quantitative high-resolution electron microscopy

By Zhang H.   Marks L.D.   Wang Y.Y.   Zhang H.   Dravid V.P.   Han P.   Payne D.A.  

Ultramicroscopy, Vol. 57, Iss. 1, 1995-01 ,pp. : 103-111

Elsevier

Access to resources Recommend Favorite

Geometric and electronic structure of Cu on corundum (0001) surfaces

By  

Science and Technology of Advanced Materials, Vol. 6, Iss. 7, 2005-10 ,pp. : 75-78

IOP Publishing

Access to resources Recommend Favorite

LACBED study of a 3 grain boundary in a Cu +6 at% Si alloy

By Kim H.S.   Goodman P.   Schwartzman A.   Tulloch P.   Forwood C.T.  

Ultramicroscopy, Vol. 77, Iss. 1, 1999-05 ,pp. : 83-95

Elsevier

Access to resources Recommend Favorite

Anomalous properties found in Cu films near below 100 nm thick deposited on Ta

By  

Science and Technology of Advanced Materials, Vol. 6, Iss. 6, 2005-09 ,pp. : 72-79

IOP Publishing

Access to resources Recommend Favorite