Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model

Publisher： IOP Publishing

ISSN： 1367-2630

Source： New Journal of Physics, Vol.11, Iss.2, 2009-02, pp. : 582-605

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Particle-in-cell/Monte Carlo collisions treatment of an Ar/O2 magnetron discharge used for the reactive sputter deposition of TiOx films

By  

New Journal of Physics, Vol. 11, Iss. 10, 2009-10 ,pp. : 110-133

IOP Publishing

Access to resources Recommend Favorite

Sputter deposition of MgxAlyOz thin films in a dual-magnetron device: a multi-species Monte Carlo model

By  

New Journal of Physics, Vol. 14, Iss. 7, 2012-07 ,pp. : 732-743

IOP Publishing

Access to resources Recommend Favorite

Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model

By  

New Journal of Physics, Vol. 13, Iss. 3, 2011-03 ,pp. : 249-265

IOP Publishing

Access to resources Recommend Favorite

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge

By Huang Shuo   Gudmundsson J T  

Plasma Sources Science and Technology, Vol. 22, Iss. 5, 2013-10 ,pp. : 55020-55035

IOP Publishing

Access to resources Recommend Favorite

Modeling the reactive sputter deposition of Ti-doped VOx thin films

By Tao Wang   He Yu   De-En Gu   Rui Guo   Xiang Dong   Ya-Dong Jiang   Rui-Lin Wu  

Chinese Physics B, Vol. 24, Iss. 6, 2015-06 ,pp. : 68104-68108

IOP Publishing

Access to resources Recommend Favorite