Observation of multiple charge states and high ion energies in high-power impulse magnetron sputtering (HiPIMS) and burst HiPIMS using a LaB₆ target

By Franz Robert   Clavero César   Bolat Rustem   Mendelsberg Rueben   Anders André  

Plasma Sources Science and Technology, Vol. 23, Iss. 3, 2014-06 ,pp. : 35001-35011

IOP Publishing

Access to resources Recommend Favorite

On the road to self-sputtering in high power impulse magnetron sputtering: particle balance and discharge characteristics

By Huo Chunqing   Lundin Daniel   Raadu Michael A   Anders André     Brenning Nils  

Plasma Sources Science and Technology, Vol. 23, Iss. 2, 2014-04 ,pp. : 25017-25027

IOP Publishing

Access to resources Recommend Favorite

On reactive high power impulse magnetron sputtering

By Gudmundsson J T  

Plasma Physics and Controlled Fusion, Vol. 58, Iss. 1, 2016-01 ,pp. : 14002-14009

IOP Publishing

Access to resources Recommend Favorite

Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

By Brenning N   Huo C   Lundin D   Raadu M A   Vitelaru C   Stancu G D   Minea T   Helmersson U  

Plasma Sources Science and Technology, Vol. 21, Iss. 2, 2012-04 ,pp. : 25005-25013

IOP Publishing

Access to resources Recommend Favorite

The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering

By Anders A   Čapek J   Hála M   Martinu L  

Journal of Physics D: Applied Physics, Vol. 45, Iss. 1, 2012-01 ,pp. : 12003-12007

IOP Publishing

Access to resources Recommend Favorite