Fabrication of a Si stencil mask for the X-ray lithography using a dry etching technique

ISSN： 1742-6596

Source： Journal of Physics: Conference Series , Vol.34, Iss.1, 2006-04, pp. : 859-864

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

By Villanueva Luis Guillermo Vazquez-Mena Oscar Martin-Olmos Cristina Savu Veronica Sidler Katrin Brugger Juergen

Micromachines, Vol. 4, Iss. 4, 2013-10 ,pp. : 370-377

MDPI

Access to resources Recommend Favorite

Fabrication of antireflection structures on glassy carbon surfaces using electron beam lithography and oxygen dry etching

Journal of Physics: Conference Series , Vol. 106, Iss. 1, 2008-03 ,pp. : 60-63

IOP Publishing

Access to resources Recommend Favorite

Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow

By Sakuma Shinya Sugita Masakuni Arai Fumihito

Micromachines, Vol. 4, Iss. 2, 2013-06 ,pp. : 232-242

MDPI

Access to resources Recommend Favorite

Digital rotation-mask technique for the fabrication of diffractive microlenses

By Gao Yiqing Wei Lanlan Luo Ningning Jin Qi Chen Min

Journal of Modern Optics, Vol. 55, Iss. 9, 2008-05 ,pp. : 1361-1373

Taylor & Francis Ltd

Access to resources Recommend Favorite

Applications of short wavelength radiation : Soft X-ray microscopy and EUV lithography

Le Journal de Physique IV, Vol. 11, Iss. PR2, 2001-07 ,pp. : Pr2-443-Pr2-449

Edp Sciences

Access to resources Recommend Favorite