Application of abnormally high sputtering rate of PbTe(Te) single crystals during inductively coupled argon plasma treatment for fabrication of nanostructures

Publisher： IOP Publishing

E-ISSN： 1361-6641|30|3|35017-35022

ISSN： 0268-1242

Source： Semiconductor Science and Technology, Vol.30, Iss.3, 2015-03, pp. : 35017-35022

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