Growth behavior and structural characteristics of TiO2 thin films using (CpN)Ti(NMe2)2 and oxygen remote plasma

Publisher: John Wiley & Sons Inc

E-ISSN: 1862-6319|212|3|674-679

ISSN: 1862-6300

Source: PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol.212, Iss.3, 2015-03, pp. : 674-679

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Abstract