Selective etching of ZnTe in HF:H2O2:H2O solution: Interpretation of extended defect‐related etch figures

E-ISSN： 1521-4079|50|3|215-222

ISSN： 0232-1300

Source： CRYSTAL RESEARCH AND TECHNOLOGY (ELECTRONIC), Vol.50, Iss.3, 2015-03, pp. : 215-222

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