Band alignment and effective work function of atomic‐layer deposited VO2 and V2O5 films on SiO2 and Al2O3

Publisher： John Wiley & Sons Inc

E-ISSN： 1610-1642|12|1‐2|238-241

ISSN： 1862-6351

Source： PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.1‐2, 2015-01, pp. : 238-241

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