Barrier Strain and Carbon Incorporation‐Engineered Performance Improvements for AlGaN/GaN High Electron Mobility Transistors**

Publisher: John Wiley & Sons Inc

E-ISSN: 1521-3862|21|1-2-3|33-40

ISSN: 0948-1907

Source: CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol.21, Iss.1-2-3, 2015-03, pp. : 33-40

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Abstract