Mechanism of the development of a weakly alkaline barrier slurry without BTA and oxidizer

Author： Xiaodong Luan   Yuling Liu   Xinhuan Niu   Juan Wang  

Publisher： IOP Publishing

ISSN： 1674-4926

Source： Journal of Semiconductors, Vol.36, Iss.7, 2015-07, pp. : 76001-76006

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