Influence of the doping level on the porosity of silicon nanowires prepared by metal-assisted chemical etching

Author: Geyer Nadine   Wollschläger Nicole   Fuhrmann Bodo   Tonkikh Alexander   Berger Andreas   Werner Peter   Jungmann Marco   Krause-Rehberg Reinhard   Leipner Hartmut S  

Publisher: IOP Publishing

E-ISSN: 1361-6528|26|24|245301-245307

ISSN: 0957-4484

Source: Nanotechnology, Vol.26, Iss.24, 2015-06, pp. : 245301-245307

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