In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures

Author： Pi T W   Lin Y H   Fanchiang Y T   Chiang T H   Wei C H   Lin Y C   Wertheim G K   Kwo J   Hong M  

Publisher： IOP Publishing

E-ISSN： 1361-6528|26|16|164001-164011

ISSN： 0957-4484

Source： Nanotechnology, Vol.26, Iss.16, 2015-04, pp. : 164001-164011

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